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NanoAccell - Accelerated Neutral Atom Beam (ANAB) Technology
Exogenesis has created a new NanoAccel technology known as accelerated neutral atom beam (ANAB). NanoAccell is used for ultra-shallow processing of surfaces used for biomedical applications, for optical components, for semiconductor devices, and for other nanosurface modified products. In ANAB, a beam of accelerated gas cluster ions is initially produced as described in GCIB, but the gas cluster is caused to dissociate and a deflector removes the charge.
Released neutral atoms then continue to travel collectively with the same velocities they had prior to being released. An electrostatic deflector is used to eliminate all residual charged species from the beam. Upon target impact, the accelerated neutral atom beams produce surface modification comparable to those associated with GCIB, but to substantially shallower depths (≤ 3 nanometers) and with appreciably greater precision and control.
- GCIB and ANAB Functionality page would have links to short sub-pages describing specific functionality:
- Sputtering
- Etching
- Smoothing
- Nanotexturing
- Amorphization
- Shallow doping
- Monolayer coating
- Drug elution barrier
- Tools Mike/Jim?
- nAccel100
- Specs
- Options
- Specimen manipulators (ALAS, small automated, small manual)
- Beam Lines (Long, Short, Gen-2 – each with 30 and 50 kV options)
- MFC (1, 2, 4-gas capability)
- University tool
- Specs
- nAccel100
We have developed a comprehensive intellectual property (IP) portfolio covering Gas Cluster Ion Beam (GCIB) and Accelerated Neutral Atom Beam (ANAB) technologies as well as their numerous applications.
Some statistics at a glance:
- 178 patents granted or pending
- 21 distinct patent families
- 124 granted patents
- 28 in the U.S.
- 96 in other locations, including numerous European countries, Canada, Israel, Japan, China, Australia, and Russia